Title:
SINTERED SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2014/097911
Kind Code:
A1
Abstract:
A sintered sputtering target which comprises an alloy having a chemical composition containing 25 to 40 mol% of Cr and a remainder made up by Co and a non-metallic substance dispersed in the alloy, said sintered sputtering target being characterized in that the intensity ratio of the X-ray diffraction peak intensity of a σ phase of the Co-Cr alloy to that of the main peak is 0.02 or less. According to the present invention, the mechanical strength of the target can be improved, and therefore the cracking of the target during sputtering can be prevented and stable sputtering can be achieved.
Inventors:
IKEDA YUKI (JP)
Application Number:
PCT/JP2013/082917
Publication Date:
June 26, 2014
Filing Date:
December 09, 2013
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22C19/07; C22C32/00; B22F3/00; B22F3/14; B22F3/15; C22C1/05
Domestic Patent References:
| WO2010074171A1 | 2010-07-01 |
Foreign References:
| JP2000096220A | 2000-04-04 | |||
| JP2010189751A | 2010-09-02 | |||
| JP2002363615A | 2002-12-18 | |||
| JP2000104160A | 2000-04-11 |
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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