Title:
SLURRY DILUTION/WASHING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/202549
Kind Code:
A1
Abstract:
[Problem] To provide a dilution/washing method whereby it is possible to remove impurities dissolved in a raw material slurry in which aggregates and a porous substance are contained as particles while replacing the raw material slurry with a smaller volume of a washing solution. [Solution] Provided is a dilution/washing method comprising: supplying a solution of interest comprising a raw material slurry having impurities dissolved therein to a filtration device to separate the solution of interest into a filtrate which contains the impurities and a post-washing slurry in which the content of the impurities is reduced in the filtration device; and supplying a solution of interest comprising the post-washing slurry and a newly added washing solution to the filtration device to remove the impurities. In the method, the manner for supplying the washing solution to be added to the post-washing slurry is changed depending on the content of the impurities dissolved in the filtrate that has been separated by the filtration device.
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Inventors:
KURITA SHINPEI (JP)
HAYAKAWA TOMOKI (JP)
HAYAKAWA TOMOKI (JP)
Application Number:
PCT/JP2022/011948
Publication Date:
September 29, 2022
Filing Date:
March 16, 2022
Export Citation:
Assignee:
TSUKISHIMA KIKAI CO (JP)
International Classes:
B01D12/00; B01D29/01; B08B3/04
Foreign References:
| JP2016172198A | 2016-09-29 | |||
| JP2004279483A | 2004-10-07 | |||
| JP2012087039A | 2012-05-10 | |||
| JPH0295404A | 1990-04-06 | |||
| US4889599A | 1989-12-26 | |||
| JPS6031761B2 | 1985-07-24 | |||
| JPH10165721A | 1998-06-23 | |||
| JP2004255283A | 2004-09-16 |
Attorney, Agent or Firm:
NAGAI INTERNATIONAL PATENT BUREAU (JP)
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