Title:
SLURRY SUPPLY DEVICE, SLURRY SUPPLY METHOD, AND SLURRY GENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/004295
Kind Code:
A1
Abstract:
A slurry supply device 1 comprises a tank 11. The tank 11 includes a space 11a around a rotation axis RA which crosses a vertical direction. Moreover, the supply device 1 comprises an inflow portion (inflow passage 71) which causes slurry 101 to flow into the space 11a, an outflow portion (outflow passage 73) which causes the slurry 101 to flow out from the space 11a, and a support portion 15 which rotatably supports the tank 11 about the rotation axis RA.
Inventors:
FUKUTA MASAHIKO (JP)
TANAKA KATSUTOSHI (JP)
TANAKA KATSUTOSHI (JP)
Application Number:
PCT/JP2021/021684
Publication Date:
January 06, 2022
Filing Date:
June 08, 2021
Export Citation:
Assignee:
SHIBAURA MACHINE CO LTD (JP)
International Classes:
B24B57/02; B01J4/00
Foreign References:
| JP2007184337A | 2007-07-19 | |||
| JP5443243B2 | 2014-03-19 |
Attorney, Agent or Firm:
IIJIMA, Yasuhiro (JP)
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