Title:
SOLID-STATE IMAGING DEVICE, ELECTRONIC MACHINE, AND SOLID-STATE IMAGING DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/241062
Kind Code:
A1
Abstract:
Provided is a solid-state imaging device capable of suppressing a reduction in a saturated charge amount of a photoelectric conversion unit while improving dark characteristics. A plurality of pixels formed on a substrate, and a pixel separating part having a trench part formed on the substrate so as to surround each of the pixels are provided. Each of the plurality of pixels has a photoelectric conversion unit formed on a side opposite to a light incident surface of the substrate, and a plurality of stages of impurity regions formed on the light incident surface side of the substrate. Each of the plurality of stages of impurity regions is formed so as to cover the light incident surface of the photoelectric conversion unit and be in contact with a side surface of the pixel separating part, and is a region doped with impurities having a conductivity type opposite to that of a charge storage region of the photoelectric conversion unit.
Inventors:
UESAKA YUSUKE (JP)
Application Number:
PCT/JP2021/015720
Publication Date:
December 02, 2021
Filing Date:
April 16, 2021
Export Citation:
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01L27/146; H04N5/374
Foreign References:
| JP2013175494A | 2013-09-05 | |||
| JP2003318383A | 2003-11-07 | |||
| JP2007258684A | 2007-10-04 |
Attorney, Agent or Firm:
TANAKA Hidetetsu et al. (JP)
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