SOLUTION FOR FORMING SILICA COATING FILM, PROCESS FOR PRODUCING THE SAME, AND SILICA COATING FILM AND PROCESS FOR PRODUCING THE SAME

Title:

SOLUTION FOR FORMING SILICA COATING FILM, PROCESS FOR PRODUCING THE SAME, AND SILICA COATING FILM AND PROCESS FOR PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2000/026311

Kind Code:

A1

Abstract:

A solution for silica coating film formation which comprises an organic solvent and a chlorosiloxane compound and can have excellent reactivity with substrates. When the solution is applied to a substrate surface in a dry atmosphere and the coated substrate is exposed to an atmosphere containing moisture, then a silica coating film excellent in durability, etc. can be produced without the need of catalyst addition or heat treatment. By adding fine anhydrous silica particles to the solution, a solution capable of viscosity control and having excellent coating film properties can be provided. When the resultant solution is applied to a substrate surface in a dry atmosphere and the coated substrate is exposed to an atmosphere containing moisture, a thick silica coating film excellent in durability, etc. can be formed without the need of catalyst addition or heat treatment. Therefore, the invention is of great industrial importance.

Inventors:

OGAWA KAZUFUMI (JP)
TAKEBE TAKAKO (JP)
OTAKE TADASHI (JP)
NOMURA TAKAIKI (JP)

Application Number:

PCT/JP1999/006143

Publication Date:

May 11, 2000

Filing Date:

November 04, 1999

Export Citation:

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Assignee:

MATSUSHITA ELECTRIC IND CO LTD (JP)
OGAWA KAZUFUMI (JP)
TAKEBE TAKAKO (JP)
OTAKE TADASHI (JP)
NOMURA TAKAIKI (JP)

International Classes:

C09D183/02; H01L21/312; H01L21/316; (IPC1-7): C09D183/02; C09J183/02; G02F1/136; H01L21/316

Domestic Patent References:

WO1997035939A1

1997-10-02

Foreign References:

JPH04311781A	1992-11-04
JPH1041293A	1998-02-13
JPH06293535A	1994-10-21
JPH10265736A	1998-10-06
JPH02294374A	1990-12-05
EP0498335A1	1992-08-12
JPH08259895A	1996-10-08

Other References: