Title:
SPECTROSCOPIC ELEMENT AND CHARGED PARTICLE BEAM DEVICE USING SAME
Document Type and Number:
WIPO Patent Application WO/2014/068689
Kind Code:
A1
Abstract:
In order to analyze an element to be evaluated with high sensitivity and high accuracy in a short period in an electron beam analysis device provided with a wavelength dispersive X-ray analysis unit in an electron microscope, one diffraction grating in which a plurality of patterns having maximum X-ray reflectances with respect to respective X-rays are formed is provided in an electron beam analysis device, and an X-ray serving as an energy reference and an X-ray spectrum to be evaluated are simultaneously detected. The positional displacement of X-ray energy due to the installation and change of the diffraction grating is corrected by the X-ray spectrum serving as the energy reference, thereby enabling high-sensitivity and high-accuracy analysis in a short period.
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Inventors:
ANAN YOSHIHIRO (JP)
KOGUCHI MASANARI (JP)
KOGUCHI MASANARI (JP)
Application Number:
PCT/JP2012/078092
Publication Date:
May 08, 2014
Filing Date:
October 31, 2012
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
G21K1/06; G01N23/225; H01J37/252
Foreign References:
| JPH03111799A | 1991-05-13 | |||
| JPH0225800A | 1990-01-29 | |||
| JP2002189004A | 2002-07-05 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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