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Patent Searching and Data


Title:
SPLICED EXPOSURE SYSTEM AND SPLICED EXPOSURE METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2021/068328
Kind Code:
A1
Abstract:
A spliced exposure system and a spliced exposure method using same. By redesigning a spliced exposure system suitable for an ultra-large-size display panel, a large-size or curved-surface display panel can be efficiently manufactured, and the influence on costs and production capacity can be reduced.

Inventors:
DU PENG (CN)
Application Number:
PCT/CN2019/117324
Publication Date:
April 15, 2021
Filing Date:
November 12, 2019
Export Citation:
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Assignee:
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G03F7/22; G03F7/20
Foreign References:
CN106200254A2016-12-07
CN1490674A2004-04-21
CN103744214A2014-04-23
CN110058484A2019-07-26
CN108594602A2018-09-28
CN106842826A2017-06-13
CN108255012A2018-07-06
CN108321088A2018-07-24
CN108761995A2018-11-06
CN107390478A2017-11-24
US5318868A1994-06-07
KR20040110381A2004-12-31
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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