Title:
SPUTTERING TARGET ALLOY AND SPUTTERING TARGET COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2016/068562
Kind Code:
A1
Abstract:
The present invention provides an alloy having excellent thermal and mechanical stability and a method for preparing same. In addition, the present invention also provides a sputtering alloy target, enabling nitride thin film coating having high hardness and amorphous thin film coating having high corrosion resistance by means of the alloy, and a method for preparing same. An alloy, according to an embodiment of the present invention, comprises three or more metal elements, wherein the alloy comprises 58 to 80 atom % Zr, 4 to 26 atom % Cu, and one or more selected from Fe, Ni and Co and ranging from 4 to 26 atom %.
Inventors:
SHIN SEUNG YONG (KR)
MOON KYOUNG IL (KR)
SUN JU HYUN (KR)
LEE CHANG HUN (KR)
MOON KYOUNG IL (KR)
SUN JU HYUN (KR)
LEE CHANG HUN (KR)
Application Number:
PCT/KR2015/011344
Publication Date:
May 06, 2016
Filing Date:
October 27, 2015
Export Citation:
Assignee:
KOREA IND TECH INST (KR)
International Classes:
C23C14/34; C22C16/00
Foreign References:
| KR20110055473A | 2011-05-25 | |||
| KR20060128860A | 2006-12-14 | |||
| KR20030020986A | 2003-03-10 | |||
| KR20140054419A | 2014-05-08 | |||
| KR20140145218A | 2014-12-23 |
Attorney, Agent or Firm:
LEE, In Haeng et al. (KR)
이인행 (KR)
이인행 (KR)
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