Title:
SPUTTERING TARGET AND MAGNETIC FILM
Document Type and Number:
WIPO Patent Application WO/2020/031461
Kind Code:
A1
Abstract:
A sputtering target containing 0.001 to 0.5 mol% of Bi, 45 mol% or less of Cr, 45 mol% or less of Pt and 60 mol% or less of Ru, also containing metal oxides in a total amount of 1 to 35 mol%, with the remainder made up by Co and unavoidable impurities.
Inventors:
IWABUCHI YASUYUKI (JP)
MASUDA MANAMI (JP)
KOSHO TAKASHI (JP)
MASUDA MANAMI (JP)
KOSHO TAKASHI (JP)
Application Number:
PCT/JP2019/020558
Publication Date:
February 13, 2020
Filing Date:
May 23, 2019
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; G11B5/65; G11B5/851
Foreign References:
| JP2001256631A | 2001-09-21 | |||
| JP2016115379A | 2016-06-23 | |||
| JP2006155861A | 2006-06-15 | |||
| JP2009090601A | 2009-04-30 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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