Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SPUTTERING TARGET FOR MAGNETIC RECORDING FILM
Document Type and Number:
WIPO Patent Application WO/2013/190943
Kind Code:
A1
Abstract:
A carbon-containing sputtering target for a magnetic recording film, characterized in that the peak intensity ratio (IG/ID) of G band to D band in Raman spectroscopy is 5.0 or more. The present invention addresses the problem of providing a sputtering target, particularly an Fe-Pt sputtering target, which is for a magnetic recording film and which contains carbon particles dispersed therein and which enables the formation of a magnetic granular film without using an expensive cosputtering device. Since carbon is a material which is not susceptible to being sintered and is susceptible to aggregation, a conventional carbon-containing sputtering target has the disadvantage that the desorption of carbon lumps occurs during sputtering to result in a sputtered film which has many particles on the surface. The present invention also addresses the problem of providing a high-density sputtering target that can overcome the disadvantage.

Inventors:
OGINO SHIN-ICHI (JP)
Application Number:
PCT/JP2013/064242
Publication Date:
December 27, 2013
Filing Date:
May 22, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
G11B5/851; C22C1/05; C22C5/04; C22C32/00; C22C38/00; C23C14/34; G11B5/64
Domestic Patent References:
WO2012073879A12012-06-07
WO2012073882A12012-06-07
WO2012132939A12012-10-04
WO2012133166A12012-10-04
Foreign References:
JP2012102387A2012-05-31
JP2006127621A2006-05-18
JP2005533182A2005-11-04
JP2013037730A2013-02-21
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
Download PDF: