Title:
SPUTTERING TARGET MATERIAL AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2021/162081
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a sputtering target material having exceptional cracking resistance, and a method for manufacturing said sputtering target material. Provided is a sputtering target material the substance of which is an alloy including B and one or more rare-earth elements, the balance being Co and/or Fe, and unavoidable impurities, wherein: the B content of the alloy is 15-30 at.% (inclusive); the one or more rare-earth elements are selected from the group consisting of Pr, Nd, Sm, Gd, Tb, Dy, and Ho; and the total rare-earth element content with respect to the one or more rare-earth elements is 0.1-10 at.% (inclusive). Also provided is a method for manufacturing said sputtering target material.
Inventors:
MATSUBARA NORIAKI (JP)
HASEGAWA HIROYUKI (JP)
HASEGAWA HIROYUKI (JP)
Application Number:
PCT/JP2021/005198
Publication Date:
August 19, 2021
Filing Date:
February 12, 2021
Export Citation:
Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
C23C14/34; C22C1/04; C22C19/07; C22C33/02; C22C38/00; H01F41/18; H01L43/08; H01L43/10
Domestic Patent References:
| WO2014115375A1 | 2014-07-31 | |||
| WO2015080009A1 | 2015-06-04 | |||
| WO2016140113A1 | 2016-09-09 |
Foreign References:
| JPH01156466A | 1989-06-20 | |||
| JP2012207274A | 2012-10-25 | |||
| CN111364013A | 2020-07-03 | |||
| JP2004346423A | 2004-12-09 | |||
| JP2017057477A | 2017-03-23 | |||
| JP2017082330A | 2017-05-18 | |||
| JP2014156639A | 2014-08-28 |
Attorney, Agent or Firm:
NAKAMURA Yukitaka et al. (JP)
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