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Title:
SPUTTERING TARGET MATERIAL
Document Type and Number:
WIPO Patent Application WO/2019/159856
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a target material (2) that is not prone to cracking during sputtering, and in order to solve this problem, the present invention provides a sputtering target material (2) including an alloy including Ta and Cr, the remainder being unavoidable impurities, wherein the flexural strength thereof measured by a three-point bending test is at least 400 MPa.

Inventors:
SHINMURA YUMEKI (JP)
Application Number:
PCT/JP2019/004750
Publication Date:
August 22, 2019
Filing Date:
February 08, 2019
Export Citation:
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Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
C23C14/34; C22C27/02; C22C27/06; C23C14/14; B22F3/10; C22C1/04
Domestic Patent References:
WO2016052371A12016-04-07
Foreign References:
JP2004039196A2004-02-05
JP2000232206A2000-08-22
JP2001131673A2001-05-15
JPH06172944A1994-06-21
JPH04308080A1992-10-30
JP2000057554A2000-02-25
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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