Title:
SPUTTERING TARGET, METHOD FOR PRODUCING MULTILAYER FILM, MULTILAYER FILM AND MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2024/053176
Kind Code:
A1
Abstract:
The present invention provides a sputtering target which enables a magnetic layer of a magnetic recording medium to maintain high coercivity, while being capable of improving magnetic separation between magnetic particles. This sputtering target contains Co and Pt as metal components, while containing NbO2 as a metal oxide component. Alternatively, this sputtering target contains Co and Pt as metal components, while having a phase that contains all of Co, Nb and O.
Inventors:
SHIMIZU MASAYOSHI (JP)
MASUDA MANAMI (JP)
IWABUCHI YASUYUKI (JP)
HONDA KAZUYA (JP)
MASUDA MANAMI (JP)
IWABUCHI YASUYUKI (JP)
HONDA KAZUYA (JP)
Application Number:
PCT/JP2023/019793
Publication Date:
March 14, 2024
Filing Date:
May 26, 2023
Export Citation:
Assignee:
JX METALS CORP (JP)
International Classes:
C23C14/34; B22F1/00; C22C1/05; C22C1/10; C22C5/04; C22C19/07; C22C32/00; C23C14/06; G11B5/706; G11B5/851; H01F10/16; H01F41/18
Domestic Patent References:
| WO2019058819A1 | 2019-03-28 | |||
| WO2014077198A1 | 2014-05-22 |
Foreign References:
| JP2013229084A | 2013-11-07 | |||
| JP2004206805A | 2004-07-22 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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