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Title:
SPUTTERING TARGET AND POWDER FOR PRODUCING SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2020/066114
Kind Code:
A1
Abstract:
The present invention provides a sputtering target which contains Ru and boron. A sputtering target which contains Ru as a main component, while containing a composite oxide that contains boron and has a higher melting point than B2O3.

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Inventors:
IWABUCHI YASUYUKI (JP)
SATO ATSUSHI (JP)
SHIMOJUKU AKIRA (JP)
SHIMIZU MASAYOSHI (JP)
Application Number:
PCT/JP2019/019571
Publication Date:
April 02, 2020
Filing Date:
May 16, 2019
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; B22F1/12; C22C1/05; C22C5/04; G11B5/738; G11B5/84
Domestic Patent References:
WO2014178310A12014-11-06
WO2016035415A12016-03-10
WO2016013334A12016-01-28
WO2018123500A12018-07-05
Foreign References:
JP2006283054A2006-10-19
JP2008101246A2008-05-01
JP2015155573A2015-08-27
JP2010514921A2010-05-06
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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