SPUTTERING TARGET - MITSUI MINING & SMELTING CO

Title:

SPUTTERING TARGET

Document Type and Number:

WIPO Patent Application WO/2018/220989

Kind Code:

Abstract:

The present invention pertains to a sputtering target containing Y and Mg and having a composition represented by (1-x)Mg-xY (where, 0

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Inventors:

TAKEYA SYUNSUKE (JP)

Application Number:

PCT/JP2018/013739

Publication Date:

December 06, 2018

Filing Date:

March 30, 2018

Export Citation:

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Assignee:

MITSUI MINING & SMELTING CO (JP)

International Classes:

C23C14/34; B22F5/00; C22C23/06; C22C28/00

Foreign References:

JP2012122138A	2012-06-28
JP2014026262A	2014-02-06

Other References:

SCHLÜTER, KRISTINA: "Corrosion performance and mechanical properties of sputter-deposited MgY and MgGd alloys", CORROSION SCIENCE, vol. 78, 11 September 2013 (2013-09-11), pages 43 - 54, XP028778314, DOI: 10.1016/j.corsci.2013.08.027
YAMADA, Y. ET AL.: "Film thickness change of switchable mirrors using Mg3Y alloy thin films due to hydrogenation and dehydrogenation", SOLAR ENERGY AND SOLAR CELLS, vol. 126, July 2014 (2014-07-01), pages 237 - 240, XP028851349, DOI: 10.1016/j.solmat.2013.06.041

Attorney, Agent or Firm:

SSINPAT PATENT FIRM (JP)

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