Title:
STAGE DEVICE, AND CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/245998
Kind Code:
A1
Abstract:
The present invention provides: a stage device that can suppress bending deformation of a mirror, and that can reduce the positioning error of a stage by reducing the measurement error of the position of the stage; and a charged particle beam device comprising this stage device. The stage device according to the present invention comprises: a table (105) on which a sample (106) is placed; a bar mirror (111) installed on the table (105); a laser interferometer (104) that irradiates the bar mirror (111) with laser light and receives reflected light from the bar mirror (111), thereby measuring the position of the table (105); a drive mechanism (103) that moves the table (105); and a plurality of elastic members (203) installed between the bar mirror (111) and the table (105).
Inventors:
TAKAHASHI MOTOHIRO (JP)
MIZUOCHI MASAKI (JP)
NAKAGAWA SHUICHI (JP)
SHIBAZAKI TOMOTAKA (JP)
OGAWA HIRONORI (JP)
KATO TAKANORI (JP)
MIZUOCHI MASAKI (JP)
NAKAGAWA SHUICHI (JP)
SHIBAZAKI TOMOTAKA (JP)
OGAWA HIRONORI (JP)
KATO TAKANORI (JP)
Application Number:
PCT/JP2021/006623
Publication Date:
December 09, 2021
Filing Date:
February 22, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/20
Foreign References:
| JP2013229530A | 2013-11-07 | |||
| JPH08329873A | 1996-12-13 | |||
| JP2006066733A | 2006-03-09 | |||
| JP2015018978A | 2015-01-29 | |||
| JPH09243316A | 1997-09-19 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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