Title:
STAGE STRUCTURE, SUBSTRATE PROCESSING DEVICE, AND METHOD FOR CONTROLLING STAGE STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2020/241461
Kind Code:
A1
Abstract:
Provided are a stage structure, a substrate processing device, and a method for controlling the stage structure, such that in-plane temperature uniformity of a substrate can be improved. The stage structure is equipped with: a disc-shaped mount base; an annular member disposed on the outer periphery side of the mount base and circumferentially divided at least into two sections; and a lifting unit for raising and lowering at least one of circular arc members formed when the annular member is divided.
Inventors:
KUBO ATSUSHI (JP)
SHINDO TAKEHIRO (JP)
SHINDO TAKEHIRO (JP)
Application Number:
PCT/JP2020/020190
Publication Date:
December 03, 2020
Filing Date:
May 21, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
C23C16/458; H01L21/683
Foreign References:
| JP2005116842A | 2005-04-28 | |||
| JP2009059864A | 2009-03-19 | |||
| JP2001210597A | 2001-08-03 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
Download PDF: