Title:
STAMP FOR MICROPATTERN TRANSFER
Document Type and Number:
WIPO Patent Application WO/2011/118289
Kind Code:
A1
Abstract:
Disclosed is a stamp (3)—that is for micropattern transfer and that has a microstructure layer (2) on a supporting substrate (1)—characterized by the aforementioned microstructure layer (2) being a polymer of a resin composition primarily containing: a silsesquioxane derivative having a plurality of polymerizable functional groups; and one or a plurality of types of monomer components having a plurality of polymerizable functional groups.
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Inventors:
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
Application Number:
PCT/JP2011/053216
Publication Date:
September 29, 2011
Filing Date:
February 16, 2011
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
International Classes:
B29C33/38; B29C59/02; G11B5/84; G11B7/26; H01L21/027
Foreign References:
| JP2010000419A | 2010-01-07 | |||
| JP2009073078A | 2009-04-09 | |||
| JP2006338844A | 2006-12-14 | |||
| JP2010036514A | 2010-02-18 | |||
| JP2010141064A | 2010-06-24 |
Attorney, Agent or Firm:
ISONO Michizo (JP)
Michizo Isono (JP)
Michizo Isono (JP)
Download PDF:
Claims:
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