Title:
STAMPER FOR MICROSTRUCTURE TRANSFER AND MICROSTRUCTURE TRANSFER DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/155582
Kind Code:
A1
Abstract:
Disclosed is a stamper for microstructure transfer, which comprises a supporting base and a microstructure layer that is formed on the surface of the supporting base. The microstructure layer has a surface layer which contains a polymer of a resin composition that contains a polymerization initiator and a silsesquioxane derivative having a plurality of polymerizable functional groups. The microstructure layer has an elastic modulus lower than 2.0 GPa. The thickness of the microstructure layer is four or more times the height of the microstructure that is formed in the surface of the microstructure layer.
Inventors:
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
YAMASHITA NAOAKI (JP)
SHIRAISHI TOSHIMITSU (JP)
TARUMITSU TAKASHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
YAMASHITA NAOAKI (JP)
SHIRAISHI TOSHIMITSU (JP)
TARUMITSU TAKASHI (JP)
Application Number:
PCT/JP2011/063307
Publication Date:
December 15, 2011
Filing Date:
June 10, 2011
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
YAMASHITA NAOAKI (JP)
SHIRAISHI TOSHIMITSU (JP)
TARUMITSU TAKASHI (JP)
ISHII SATOSHI (JP)
OGINO MASAHIKO (JP)
SHIZAWA NORITAKE (JP)
MORI KYOICHI (JP)
MIYAUCHI AKIHIRO (JP)
YAMASHITA NAOAKI (JP)
SHIRAISHI TOSHIMITSU (JP)
TARUMITSU TAKASHI (JP)
International Classes:
H01L21/027; B29C33/40; B29C59/02; G11B5/84; G11B7/26
Domestic Patent References:
| WO2011077882A1 | 2011-06-30 |
Foreign References:
| JP2008019292A | 2008-01-31 | |||
| JP2010052151A | 2010-03-11 | |||
| JP2009184275A | 2009-08-20 | |||
| JP2008246876A | 2008-10-16 | |||
| JP2005534960A | 2005-11-17 | |||
| JP2003100609A | 2003-04-04 | |||
| JPH01157808A | 1989-06-21 | |||
| JP2010141064A | 2010-06-24 | |||
| JP2011170207A | 2011-09-01 | |||
| JP2010280159A | 2010-12-16 | |||
| JP2010040879A | 2010-02-18 | |||
| JP2009060091A | 2009-03-19 | |||
| JP2000246810A | 2000-09-12 | |||
| JP2010283108A | 2010-12-16 |
Other References:
CARLOS PINA-HERNANDEZ: "Easy duplication of stamps using UV-cured fluoro-silsesquioxane for nanoimprint lithography", J. VAC. SCI. TECHNOL. B, vol. 26, no. 6, 1 December 2008 (2008-12-01), pages 2426 - 2429
JAE YEOB SHIM: "Sub-50 nm Template Fabrications for Nanoimprint Lithography Using Hydrogen Silsesquioxane and Silicon Nitride", J. NANOSCI. NANOTECHNOL., vol. 10, no. 5, May 2010 (2010-05-01), pages 3628 - 3630
JAE YEOB SHIM: "Sub-50 nm Template Fabrications for Nanoimprint Lithography Using Hydrogen Silsesquioxane and Silicon Nitride", J. NANOSCI. NANOTECHNOL., vol. 10, no. 5, May 2010 (2010-05-01), pages 3628 - 3630
Attorney, Agent or Firm:
POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)
Polaire Intellectual Property Corporation (JP)
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