Title:
STAND ALONE PLASMA VACUUM PUMP
Document Type and Number:
WIPO Patent Application WO2001080281
Kind Code:
A3
Abstract:
A stand-alone plasma vacuum pump for pumping gas from a low-pressure inlet to a high-pressure outlet, composed of: a housing enclosing one or more pumping regions located between the inlet and the outlet; a plurality of permanent magnet assemblies providing magnetic fields that extend in the pumping region between the inlet and the outlet, the magnetic field forming magnetic flux channels for guiding and confining plasmas; elements disposed for coupling microwave power into the flux channels to heat electrons, ionize gas, and accelerate plasma ions in a direction from the inlet to the outlet; elements disposed for creating an electric in the magnetic flux channels to accelerate ions in the flux channels toward the outlet by momentum transfer; and a differential conductance baffle proximate to the outlet for promoting flow of plasma ions and neutral atoms to the outlet while impeding flow of neutral gas molecules in a direction from the outlet toward the inlet.
Inventors:
DANDL RAPHAEL A (US)
QUON BILL H (US)
QUON BILL H (US)
Application Number:
PCT/US2001/011111
Publication Date:
August 22, 2002
Filing Date:
April 06, 2001
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
DANDL RAPHAEL A (US)
QUON BILL H (US)
DANDL RAPHAEL A (US)
QUON BILL H (US)
International Classes:
H05H1/46; B01J3/02; H01J41/12; H01J41/18; H01L21/3065; H01L21/31; H05H1/14; (IPC1-7): H01J41/12
Foreign References:
| US4641060A | 1987-02-03 | |||
| US5165861A | 1992-11-24 | |||
| US5975855A | 1999-11-02 | |||
| US5453125A | 1995-09-26 |
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