Title:
STATIONARY INDUCTION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/002088
Kind Code:
A1
Abstract:
According to the present invention, power for operating an attached device such as a monitoring means or a cooling means for a stationary induction apparatus is stably and safely supplied at low cost from the stationary induction apparatus itself without having a separate power line or using a battery. The stationary induction apparatus is characterized by comprising a primary winding and a secondary winding wound around an iron core, wherein a power supply winding, which differs from the primary winding and the secondary winding and is for supplying power to an attached device, is wound around the iron core.
Inventors:
KURITA NAOYUKI (JP)
SATO KOHEI (JP)
NAKANOUE KENJI (JP)
SATO KOHEI (JP)
NAKANOUE KENJI (JP)
Application Number:
PCT/JP2020/018054
Publication Date:
January 07, 2021
Filing Date:
April 28, 2020
Export Citation:
Assignee:
HITACHI INDUSTRY EQUIPMENT SYSTEMS CO LTD (JP)
International Classes:
H01F30/04; H01F27/00; H01F27/08; H01F27/28; H01F30/12
Domestic Patent References:
WO2018165636A1 | 2018-09-13 |
Foreign References:
CN109559880A | 2019-04-02 | |||
JPH02285935A | 1990-11-26 | |||
JPH0666014U | 1994-09-16 | |||
JPS58182213A | 1983-10-25 | |||
EP3299783A1 | 2018-03-28 | |||
US2284406A | 1942-05-26 | |||
CN107818863A | 2018-03-20 | |||
CN108597737A | 2018-09-28 |
Attorney, Agent or Firm:
SEIRYO I.P.C. (JP)
Download PDF:
Previous Patent: AIR CONDITIONER
Next Patent: POLISHING PAD, POLISHING DEVICE, POLISHING METHOD USING SAME, AND METHOD FOR MANUFACTURING POLISHING...
Next Patent: POLISHING PAD, POLISHING DEVICE, POLISHING METHOD USING SAME, AND METHOD FOR MANUFACTURING POLISHING...