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Title:
STRUCTURE AND FILM HAVING SURFACE EXHIBITING HIGH HARDNESS AND PROVIDING HIGH SLIPPAGE OF WATER, AND METHOD FOR PREPARATION THEREOF
Document Type and Number:
WIPO Patent Application WO/2001/036190
Kind Code:
A1
Abstract:
A structure and a film having a surface which exhibits high hardness and provides excellent slippage of water, characterized in that at least a part of the surface of a base structure having a first roughness further has a second roughness which is smaller than the first roughness. The structure or film has a surface which is markedly slippery for water drops and at the same time exhibits high hardness.

Inventors:
NAKAJIMA AKIRA (JP)
WATANABE TOSHIYA (JP)
HASHIMOTO KAZUHITO (JP)
FUJISHIMA AKIRA (JP)
Application Number:
PCT/JP2000/007841
Publication Date:
May 25, 2001
Filing Date:
November 08, 2000
Export Citation:
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Assignee:
CT FOR ADVANCED SCIENCE & TECH (JP)
NAKAJIMA AKIRA (JP)
WATANABE TOSHIYA (JP)
HASHIMOTO KAZUHITO (JP)
FUJISHIMA AKIRA (JP)
International Classes:
B05D5/00; B05D5/08; C08J5/00; C09D5/00; C09D133/00; C09D183/02; C09D185/00; C09D201/00; C09K3/18; (IPC1-7): B32B3/30; B05D5/00; C08K3/18; C09D5/00; C09D201/00
Foreign References:
JPH10156282A1998-06-16
JPH11172455A1999-06-29
JPH07328532A1995-12-19
JPH09279056A1997-10-28
JPH0445181A1992-02-14
JPH10263474A1998-10-06
JPH08323285A1996-12-10
JPH08195126A1996-07-30
JPH04288349A1992-10-13
JPH05115845A1993-05-14
JPH1191024A1999-04-06
JPH11300270A1999-11-02
Attorney, Agent or Firm:
Ban, Toshimitsu (1-9 Nishishinjuku 8-chome Shinjuku-ku, Tokyo, JP)
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