Title:
STRUCTURE AND METHOD FOR ACQUIRING CAPACITANCE VALUE IN ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2016/106850
Kind Code:
A1
Abstract:
A structure and method for acquiring a capacitance value in an array substrate, the structure comprising: a first conductive region (204) in the same layer as a first conductive layer in an array substrate; a second conductive region (205) in the same layer as a second conductive layer in the array substrate, the second conductive region (205) and the first conductive region (204) partially or completely overlapping; a first measurement region (202) connected to the first conductive region (204); and a second measurement region (203) connected to the second conductive region (205). The structure enables detection of a capacitance value corresponding to a subpixel, thus providing a data basis for estimating performance and quality of a subpixel and a liquid crystal panel.
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Inventors:
QUE XIANGDENG (CN)
Application Number:
PCT/CN2015/070692
Publication Date:
July 07, 2016
Filing Date:
January 14, 2015
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G01R27/26; G02F1/13
Foreign References:
| CN1743858A | 2006-03-08 | |||
| CN101140744A | 2008-03-12 | |||
| US20060279321A1 | 2006-12-14 | |||
| US20040100287A1 | 2004-05-27 | |||
| CN1773442A | 2006-05-17 | |||
| JP2001051620A | 2001-02-23 |
Attorney, Agent or Firm:
YUHONG INTELLECTUAL PROPERTY LAW FIRM (CN)
北京聿宏知识产权代理有限公司 (CN)
北京聿宏知识产权代理有限公司 (CN)
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