Title:
STRUCTURE, METHOD FOR PRODUCING STRUCTURE, COMPOSITION FOR FORMING ABSORBENT LAYER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/039172
Kind Code:
A1
Abstract:
A structure having a color filter that exhibits excellent light resistance is provided. Also provided are: a method for producing the structure having a color filter that exhibits excellent light resistance; a composition for forming an absorbent layer for use in the structure; and a solid-state imaging element and an image display device that comprise the structure. This structure has: a color filter 10 having two or more different types of pixels; and an absorbent layer 20 that comprises at least one colorant selected from yellow colorants and colorants having a maximum absorption wavelength in the wavelength range of 400-500 nm, wherein the absorbent layer 20 is disposed on the optical path of at least one type of pixel in the color filter 10 on the side from which light enters the pixels.
Inventors:
TAKISHITA HIROTAKA (JP)
NAKAMURA SHOICHI (JP)
TAGUCHI HIROSHI (JP)
NAKAMURA SHOICHI (JP)
TAGUCHI HIROSHI (JP)
Application Number:
PCT/JP2018/027737
Publication Date:
February 28, 2019
Filing Date:
July 24, 2018
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/22; G02B5/20; G02F1/1335; H01L27/146; H04N9/07; C09B45/14; C09B45/24; C09B47/10; C09B57/04; C09B67/20
Foreign References:
| JP2003294932A | 2003-10-15 | |||
| JP2006313974A | 2006-11-16 | |||
| JP2011176182A | 2011-09-08 | |||
| JP2006078766A | 2006-03-23 | |||
| JP2016075886A | 2016-05-12 | |||
| JP2009152314A | 2009-07-09 | |||
| JP2009152315A | 2009-07-09 | |||
| JP2017203810A | 2017-11-16 | |||
| JP2017167389A | 2017-09-21 |
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
Download PDF: