Title:
SUBSTRATE ANNEALING APPARATUS USING LASER-LIGHT-EMITTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/145875
Kind Code:
A1
Abstract:
The present invention provides a substrate annealing apparatus comprising: a process chamber in which a flat substrate to be annealed is located, and which includes a beam emission plate located under the flat substrate and an infrared transmission plate located above the flat substrate; a beam emission module for emitting a laser beam at the lower surface of the flat substrate through the beam emission plate; and a gas circulation cooling module for spraying cooling gas onto the upper surface of the infrared transmission plate and cooling same.
Inventors:
KWON OH SUNG (KR)
LEE JIN HONG (KR)
LEE NAM CHUN (KR)
LEE JIN HONG (KR)
LEE NAM CHUN (KR)
Application Number:
PCT/KR2021/019710
Publication Date:
July 07, 2022
Filing Date:
December 23, 2021
Export Citation:
Assignee:
VIATRON CO LTD (KR)
International Classes:
H01L21/67; B01D46/44; H01L21/687; H01S5/183; H01S5/40
Foreign References:
| US20150155190A1 | 2015-06-04 | |||
| KR20160082832A | 2016-07-11 | |||
| KR20100014208A | 2010-02-10 | |||
| KR20200082699A | 2020-07-08 | |||
| KR20110009187A | 2011-01-27 |
Attorney, Agent or Firm:
KIM, Ho Jong (KR)
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