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Patent Searching and Data


Title:
SUBSTRATE CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/053995
Kind Code:
A1
Abstract:
A rotary retaining part retains a center part of the lower surface of a substrate and rotates. First and second linear-motion retaining parts respectively retain mutually opposite first and second regions of a peripheral edge part of the lower surface of the substrate, and move reciprocally in a direction parallel to a first direction. A lower-surface cleaner cleans the center part of the lower surface of the substrate when the substrate is retained by the first and second linear-motion retaining parts, and cleans the peripheral edge parts of the lower surface of the substrate when the substrate is being retained and rotated by the rotary retaining part. The first linear-motion retaining part includes a plurality of first adhesion pads for retaining the first region of the substrate by suction, and the second linear-motion retaining part includes a plurality of second adhesion pads for retaining the second region of the substrate by suction.

Inventors:
KOMORI JUN (JP)
NISHIYAMA KOJI (JP)
Application Number:
JP2020/030386
Publication Date:
March 25, 2021
Filing Date:
August 07, 2020
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
B08B1/04; B08B3/04; G02F1/1333; H01L21/304; H01L21/683
Attorney, Agent or Firm:
NAKAGAWA, Masahiro et al. (4-1 Hiroshiba-cho, Suita-sh, Osaka 52, JP)
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