Title:
SUBSTRATE CLEANING METHOD, GLASS SUBSTRATE MANUFACTURING METHOD, EUVL MASK BLANK MANUFACTURING METHOD, AND SUBSTRATE CLEANING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/145431
Kind Code:
A1
Abstract:
This substrate cleaning method has the following steps (A) to (G): (A) holding a substrate horizontally with a holding part; (B) forming a liquid film on an upper surface of the substrate held by the holding part; (C) bringing a vibrating surface of a cleaning head into contact with the liquid film; (D) vibrating the vibrating surface with an ultrasonic vibrator; (E) rotating the substrate together with the holding part and moving the cleaning head in a horizontal direction perpendicular to the rotation center line of the holding part; (F) measuring the distance between a second substrate, which was prepared separately from the substrate, and the cleaning head or the sound pressure acting on the second substrate in a state in which the second substrate is held by the holding part; and (G) controlling at least one selected from the vertical position of the cleaning head or the holding part, the output of the ultrasonic vibrator, the rotational speed of the holding part, and the moving speed of the cleaning head in the horizontal direction on the basis of the measured results.
Inventors:
MIYAMOTO NAOAKI (JP)
NAKAJIMA MAKOTO (JP)
NAKAJIMA MAKOTO (JP)
Application Number:
PCT/JP2023/000433
Publication Date:
August 03, 2023
Filing Date:
January 11, 2023
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
H01L21/304
Foreign References:
| JP2015045847A | 2015-03-12 | |||
| JP2019109277A | 2019-07-04 | |||
| JP2013084667A | 2013-05-09 | |||
| JP2008306108A | 2008-12-18 | |||
| JP2014132639A | 2014-07-17 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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