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Title:
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/077728
Kind Code:
A1
Abstract:
Embodiments of the present disclosure provide a substrate cleaning method. The method comprises: exposing a substrate to a cleaning agent to remove impurities on the surface of the substrate; exposing the substrate to a liquid dehumidification chemical agent to remove the cleaning agent on the surface of the substrate; curing the liquid dehumidification chemical agent remaining on the surface of the substrate to obtain a solid-state dehumidification chemical agent; and sublimating and removing the solid-state dehumidification chemical agent.

Inventors:
LEE SHIH-HUNG (CN)
Application Number:
PCT/CN2022/087091
Publication Date:
May 11, 2023
Filing Date:
April 15, 2022
Export Citation:
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Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
H01L21/02
Foreign References:
CN103650116A2014-03-19
CN105489529A2016-04-13
TW201432808A2014-08-16
US20050208774A12005-09-22
CN1567541A2005-01-19
Attorney, Agent or Firm:
CHINA PAT INTELLECTUAL PROPERTY OFFICE (CN)
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