Title:
SUBSTRATE HEATING APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2015/100790
Kind Code:
A1
Abstract:
A substrate heating apparatus and a substrate heating method. The apparatus comprises a heating furnace (10), a platform (20) disposed in the heating furnace (10), a to-be-heated substrate (30) disposed on the platform (20) and multiple heaters (40) disposed at intervals above the substrate (30) and used for heating the substrate (30), and also comprises reflective sheets (50) fixed separately above the multiple heaters and a rotation controller (60) fixed on the inner surface of the wall of the heating furnace (10) and used for controlling the rotation of the reflective sheets. By means of the solutions, temperatures of all of the regions on the substrate (30) are uniform, thereby allowing for precision control of the temperature uniformity of the substrate.
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Inventors:
QIN SHIJIAN (CN)
Application Number:
PCT/CN2014/070503
Publication Date:
July 09, 2015
Filing Date:
January 13, 2014
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
QIN SHIJIAN (CN)
QIN SHIJIAN (CN)
International Classes:
F27D19/00; H01L21/00
Foreign References:
| CN102576676A | 2012-07-11 | |||
| CN101748390A | 2010-06-23 | |||
| CN101008074A | 2007-08-01 | |||
| CN101350293A | 2009-01-21 | |||
| CN103422052A | 2013-12-04 | |||
| US5889258A | 1999-03-30 |
Attorney, Agent or Firm:
CENFO INTELLECTUAL PROPERTY AGENCY (CN)
深圳市世纪恒程知识产权代理事务所 (CN)
深圳市世纪恒程知识产权代理事务所 (CN)
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