Title:
SUBSTRATE FOR PATTERN FORMATION
Document Type and Number:
WIPO Patent Application WO/2019/026803
Kind Code:
A1
Abstract:
A substrate for pattern formation has at least a base material and a portion derived from a perfluoro(poly)ether-group-containing silane compound, the base material having at least one main surface that has a first region and a second region, which is a pattern formation region adjacent to the first region, and the portion derived from a perfluoro(poly)ether-group-containing silane compound being disposed in the first region.
Inventors:
HONDA YOSHIAKI (JP)
Application Number:
PCT/JP2018/028306
Publication Date:
February 07, 2019
Filing Date:
July 27, 2018
Export Citation:
Assignee:
DAIKIN IND LTD (JP)
International Classes:
B32B27/00; B05D1/32; B05D7/24; H05K1/02; H05K3/12
Domestic Patent References:
| WO2004027889A1 | 2004-04-01 | |||
| WO2014069592A1 | 2014-05-08 |
Foreign References:
| JP2004146478A | 2004-05-20 | |||
| JP2017133003A | 2017-08-03 | |||
| JP2016132719A | 2016-07-25 | |||
| JP2012511635A | 2012-05-24 | |||
| JP2016048601A | 2016-04-07 | |||
| JP2013117012A | 2013-06-13 |
Other References:
See also references of EP 3663087A4
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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