Title:
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/061831
Kind Code:
A1
Abstract:
This substrate processing apparatus is provided with: a storage tank for storing a liquid; a substrate supporting unit (10), which horizontally supports a substrate (W) such that the substrate can rotate; and a plate drive unit (30a), which moves the substrate supporting unit (10) between an immersing position where the substrate (W) is immersed in the liquid stored in the storage tank, and a separating position where the substrate (W) is separated from the liquid stored in the storage tank, said separating position being above the immersing position. The substrate processing apparatus is also provided with: a rotary drive unit (30M), which rotates the substrate (W) supported by the substrate supporting unit (10); and liquid supply units (10n, 20m, 20n), which respectively supply liquids to the substrate (W) being rotated at the separating position by means of the rotary drive unit (30M).
Inventors:
NAGAMINE SHUICHI (JP)
HASHIMOTO YUSUKE (JP)
HASHIMOTO YUSUKE (JP)
Application Number:
PCT/JP2012/076734
Publication Date:
May 02, 2013
Filing Date:
October 16, 2012
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/304; H01L21/027
Foreign References:
| JP2011103361A | 2011-05-26 | |||
| JP2010010555A | 2010-01-14 | |||
| JP2008227386A | 2008-09-25 | |||
| JPH04357836A | 1992-12-10 |
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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Claims: