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Title:
SUBSTRATE PROCESSING DEVICE COMPRISING DOOR UNIT HAVING INCLINED SURFACE
Document Type and Number:
WIPO Patent Application WO/2021/112417
Kind Code:
A1
Abstract:
The substrate processing device according to one embodiment may comprise: a chamber unit provided with a processing space therein and comprising an inclined chamber surface having an opening; a door unit comprising an inclined door surface, which corresponds to the inclined chamber surface, and capable of being coupled to the chamber unit; and a door driving unit for driving the door unit so as to open/close the processing space.

Inventors:
KIM HYUNG CHUL (KR)
LEE DONG HWA (KR)
JUNG YOU SUN (KR)
Application Number:
PCT/KR2020/015388
Publication Date:
June 10, 2021
Filing Date:
November 05, 2020
Export Citation:
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Assignee:
KCTECH CO LTD (KR)
International Classes:
H01L21/67
Foreign References:
JP2013041711A2013-02-28
KR20180045961A2018-05-08
KR101027325B12011-04-06
JP2013131729A2013-07-04
KR20190070507A2019-06-21
Attorney, Agent or Firm:
MUHANN PATENT & LAW FIRM (KR)
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