Title:
SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING DEVICE, AND PROGRAM
Document Type and Number:
WIPO Patent Application WO/2023/112585
Kind Code:
A1
Abstract:
The present invention has: a step of providing a substrate having exposed on a surface thereof an electrically conductive film and an insulating film; and a step of selectively forming an oxide film on the surface of the insulating film out of the electrically conductive film and the insulating film, by supplying to the substrate a catalyst, an oxidant, and a raw material that does not contain halogen in a non-plasma atmosphere.
Inventors:
NAKATANI KIMIHIKO (JP)
HASHIMOTO YOSHITOMO (JP)
HIROSE YOSHIRO (JP)
KAWASAKI FUMIO (JP)
NAGATA KEISUKE (JP)
OOTSUKA YASUNORI (JP)
HASHIMOTO YOSHITOMO (JP)
HIROSE YOSHIRO (JP)
KAWASAKI FUMIO (JP)
NAGATA KEISUKE (JP)
OOTSUKA YASUNORI (JP)
Application Number:
PCT/JP2022/042506
Publication Date:
June 22, 2023
Filing Date:
November 16, 2022
Export Citation:
Assignee:
KOKUSAI ELECTRIC CORP (JP)
AIR WATER INC (JP)
AIR WATER INC (JP)
International Classes:
C23C16/04; H01L21/316; C23C16/40; C23C16/455; H01L21/31
Foreign References:
| US20150299848A1 | 2015-10-22 | |||
| JP2015165523A | 2015-09-17 | |||
| JP2021504947A | 2021-02-15 | |||
| US20200020580A1 | 2020-01-16 | |||
| US20180323102A1 | 2018-11-08 |
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
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