Title:
SUBSTRATE PRODUCTION METHOD AND SUBLIMATION DRYING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/042736
Kind Code:
A1
Abstract:
This substrate production method includes a preparation step for preparing a substrate that has a relief structure at the surface thereof, an arrangement step for arranging the substrate inside a chamber with a cleaning liquid held in at least the recesses of the relief structure, a supply step for supplying a liquid sublimable substance or a liquid sublimable film formation composition that includes a sublimable substance to at least the recesses of the substrate as arranged in the chamber, and a sublimation drying step for solidifying, sublimating, and thereby removing a film of the sublimable substance or sublimable film formation composition that has been supplied. When Tdp°C is the dew point temperature of the atmosphere inside the chamber at 1 atmosphere and Tmin°C is the minimum temperature of the surface of the film during solidification, the sublimation drying step is controlled such that Tdp and Tmin satisfy Tmin>Tdp.
Inventors:
TERUI YOSHIHARU (JP)
YOSHIDA AYAKA (JP)
YOSHIDA AYAKA (JP)
Application Number:
PCT/JP2022/033662
Publication Date:
March 23, 2023
Filing Date:
September 08, 2022
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JP2020136355A | 2020-08-31 | |||
| JP2012243869A | 2012-12-10 | |||
| JP2012243869A | 2012-12-10 | |||
| JP2021150186A | 2021-09-27 |
Attorney, Agent or Firm:
HAYAMI Shinji (JP)
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