Title:
SUBSTRATE SUPPORT POSITION ADJUSTMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/075930
Kind Code:
A1
Abstract:
The present invention relates to a substrate support position adjustment device for adjusting the position of a substrate support which supports the bottom surface of a substrate while being placed inside a processing chamber of a substrate processing system, wherein the device comprises: pole-shaped support rods coupled to the bottom surface of a central portion of the substrate support; a carrier portion onto which a lower end of each support rod is coupled; a servo motor provided at each lower end of a vertical rail portion to independently control the forward and reverse rotation of a ball screw; an elevation member which is screw-coupled into a ball screw of the vertical rail portion and moves up and down along the ball screw according to the forward and reverse rotation of the servo motor; and three or more tilting motion transmission portions which transmit, to a carrier portion, a tilting or moving motion generated on a horizontal axis parallel to the side tangent line of the carrier portion by the raising and lowering of the elevation member, while one end of each tilting motion transmission portion is coupled to the elevation member and the other end thereof is coupled to the side surface of the carrier portion.
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Inventors:
AN KI CHOUL (KR)
Application Number:
PCT/KR2023/008569
Publication Date:
April 11, 2024
Filing Date:
June 21, 2023
Export Citation:
Assignee:
ANH CO LTD (KR)
International Classes:
H01L21/68; H01L21/687
Foreign References:
| KR20210084892A | 2021-07-08 | |||
| KR20200021293A | 2020-02-28 | |||
| KR101657101B1 | 2016-09-13 | |||
| KR102405959B1 | 2022-06-07 | |||
| KR102325102B1 | 2021-11-11 |
Attorney, Agent or Firm:
NURY PATENT LAW FIRM (KR)
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