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Title:
SUBSTRATE TO BE SUBJECTED TO EVAPORATION, DISPLAY SUBSTRATE AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/230828
Kind Code:
A1
Abstract:
Provided in the present disclosure are a substrate to be subjected to evaporation, a display substrate and a preparation method therefor. The substrate to be subjected to evaporation comprises: a substrate, which comprises an area to be subjected to evaporation and a non-evaporation area, the non-evaporation area surrounding the area to be subjected to evaporation; and a support pattern, which is arranged on the substrate and is located in the non-evaporation area, wherein the support pattern comprises a plurality of support structures for supporting a mask, and comprises a first symmetric figure, the first symmetric figure is composed of the plurality of support structures, and the plurality of support structures, which constitute the first symmetric figure, are distributed along the periphery of the area to be subjected to evaporation. The present disclosure can improve the evaporation effect.

Inventors:
QIN CHENGJIE (CN)
ZHOU HONGJUN (CN)
YAN ZHUORAN (CN)
LU YANWEI (CN)
SHI QUAN (CN)
CHENG YUDIAO (CN)
ZHOU ZHENLI (CN)
JI FENGLI (CN)
Application Number:
PCT/CN2022/096205
Publication Date:
December 07, 2023
Filing Date:
May 31, 2022
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
CHENGDU BOE OPTOELECT TECH CO (CN)
International Classes:
H01L51/52; H01L27/32
Foreign References:
US20100033084A12010-02-11
CN114335129A2022-04-12
CN107871775A2018-04-03
CN106910841A2017-06-30
CN105154823A2015-12-16
CN107871773A2018-04-03
Attorney, Agent or Firm:
BEIJING BESTIPR INTELLECTUAL PROPERTY LAW CORPORATION (CN)
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