Title:
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2022/035099
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment apparatus and a substrate treatment method, the apparatus comprising: a first chamber in which a first treatment process is performed on a substrate; a second chamber in which a second treatment process is performed on the substrate; a first gas spray unit which sprays gas into the first chamber; a second gas spray unit which sprays gas into the second chamber; a gas supply unit which supplies gas; and a path change unit which changes the direction of gas flow so that the gas from the gas supply unit is supplied to each of the first gas spray unit and the second gas spray unit.
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Inventors:
HWANG CHUL JOO (KR)
Application Number:
PCT/KR2021/009850
Publication Date:
February 17, 2022
Filing Date:
July 29, 2021
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
C23C16/54; C23C16/455; C23C16/52; H01J37/32
Foreign References:
| KR20150108781A | 2015-09-30 | |||
| US20180046206A1 | 2018-02-15 | |||
| KR20100067644A | 2010-06-21 | |||
| KR20120134816A | 2012-12-12 | |||
| JP2003074800A | 2003-03-12 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
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