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Title:
SUBSTRATE TREATMENT DEVICE, AND METHOD FOR CLEANING OF SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/002159
Kind Code:
A1
Abstract:
A substrate treatment device comprising: an outer tube which serves as a chamber from which a gas can be discharged by means of a vacuum pump; an inner tube which is arranged in the outer tube and has an opening and in which an substrate is to be placed; a gas supply unit for introducing a gas into the inner tube; a heater for heating the substrate, the outer tube and the inner tube; and a trap unit which is arranged in a space formed between the outer tube and the inner tube.

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Inventors:
SUGITA KIPPEI (JP)
KUMAGAI YASUNORI (JP)
HASEGAWA HARUNARI (JP)
FUKUMORI KOJI (JP)
Application Number:
PCT/JP2011/063812
Publication Date:
January 05, 2012
Filing Date:
June 16, 2011
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
SUGITA KIPPEI (JP)
KUMAGAI YASUNORI (JP)
HASEGAWA HARUNARI (JP)
FUKUMORI KOJI (JP)
International Classes:
H01L21/31; C23C16/44; H01L21/312
Foreign References:
JPH05160029A1993-06-25
JPH10189465A1998-07-21
JP2009194099A2009-08-27
JP2001308082A2001-11-02
Attorney, Agent or Firm:
ITOH, TADAHIKO (JP)
Tadahiko Ito (JP)
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Claims:



 
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