SUBSTRATE TREATMENT DEVICE AND METHOD AND ENCODER SCALE TREATED BY THIS METHOD

Title:

SUBSTRATE TREATMENT DEVICE AND METHOD AND ENCODER SCALE TREATED BY THIS METHOD

Document Type and Number:

WIPO Patent Application WO2003041905

Kind Code:

A8

Abstract:

The invention provides a substrate treatment method and apparatus to produce a pattern on the substrate (10). Embodiments show a substrate (10) in the form of a rotary encoder ring (10) having a pattern of marks producable by means of a laser treatment device (122) controllable by a controller (100, 110) to produce the pattern in the correct manner whilst there is continuous relative displacement between the ring (10) and the laser treatment device (122).

Inventors:

ELLIN ALEXANDER DAVID SCOTT (GB)
HENSHAW JAMES REYNOLDS (GB)
MCMURTRY DAVID ROBERTS (GB)

Application Number:

PCT/GB2002/005179

Publication Date:

August 05, 2004

Filing Date:

November 15, 2002

Export Citation:

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Assignee:

RENISHAW PLC (GB)
ELLIN ALEXANDER DAVID SCOTT (GB)
HENSHAW JAMES REYNOLDS (GB)
MCMURTRY DAVID ROBERTS (GB)

International Classes:

B23K26/04; G01D5/347; B23K26/00; (IPC1-7): B23K26/08; B23K26/04

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