Title:
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTION FILM, AND REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2012/105698
Kind Code:
A1
Abstract:
Provided is a substrate with a conductive film for EUV mask blanks, which is capable of suppressing substrate deformation as a result of film stress in EUV mask blanks. The conductive film exhibits excellent adhesion with electrostatic chucks and excellent surface smoothness, along with low sheet resistance. A substrate with a conductive film is used in the production of reflective mask blanks for EUV lithography, wherein the conductive film is formed on the substrate. The substrate is characterized in that the conductive film has a layer (lower layer) where the conductive film is formed on the substrate side thereof, and at least two layers (upper layers) formed on the lower layer, with the lower layer of the conductive film containing chromium (Cr), oxygen (O), and hydrogen (H), and the upper layer of the conductive film containing chromium (Cr), nitrogen (N), and hydrogen (H).
Inventors:
MAESHIGE KAZUNOBU (JP)
HAYASHI KAZUYUKI (JP)
UNO TOSHIYUKI (JP)
HAYASHI KAZUYUKI (JP)
UNO TOSHIYUKI (JP)
Application Number:
PCT/JP2012/052542
Publication Date:
August 09, 2012
Filing Date:
February 03, 2012
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
MAESHIGE KAZUNOBU (JP)
HAYASHI KAZUYUKI (JP)
UNO TOSHIYUKI (JP)
MAESHIGE KAZUNOBU (JP)
HAYASHI KAZUYUKI (JP)
UNO TOSHIYUKI (JP)
International Classes:
H01L21/027; G03F1/24
Domestic Patent References:
| WO2008072706A1 | 2008-06-19 | |||
| WO2007069417A1 | 2007-06-21 |
Foreign References:
| JP2010045317A | 2010-02-25 | |||
| JP2005210093A | 2005-08-04 |
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
Spring name Kenji (JP)
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Claims: