Title:
SUBSTRATE WORK MACHINE AND CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/095110
Kind Code:
A1
Abstract:
This substrate work machine comprises: a supplying member that supplies, to an electronic substrate, a fluid to be used for manufacturing the electronic substrate; a first support part to which a first wiping body is provided; a second support part to which a second wiping body is provided; an actuator that moves at least one of the first support part and the second support part; and a controller that executes a cleaning process for cleaning the supplying member by bringing the first support part and the second support part into a state of proximity using the actuator.
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Inventors:
NAKAGAWA FUMITO (JP)
Application Number:
PCT/JP2019/044243
Publication Date:
May 20, 2021
Filing Date:
November 12, 2019
Export Citation:
Assignee:
FUJI CORP (JP)
International Classes:
H05K13/00; H05K13/04
Foreign References:
JP2018058045A | 2018-04-12 | |||
JP2004314004A | 2004-11-11 | |||
JP2018190904A | 2018-11-29 | |||
JP2017148742A | 2017-08-31 | |||
JP2010129606A | 2010-06-10 |
Attorney, Agent or Firm:
NEXT INTERNATIONAL et al. (JP)
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