SULPHONIUM SALT INITIATORS

WIPO Patent Application WO2007118794

B1

Compounds of the formula (I), L, L', L", L₁, L'₁, L"₁, L₂, L'₂, L"₂, L₃, L'₃, L"₃, L₄, L'₄, L"₄, L₅, L'₅, L"₅, L₆, L'₆, L"₆, L₇, L'₇, L"₇, L₈, L'₈ and L"₈ independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L₃ and L₅, L'₃ and L'₅ or L"₃ and L"₅ together denote a single bond, provided that the respective X, X' or X" is not a single bond; and/or L₃ and L₅, L'₃ and L'₅ or L"₃ and L"₅ together denote an organic linking group; and/or one or more of the pairs L₁ and L₃, L₁ and L, L₅ and L₇, L'₁ and L'₃, L'₁ and L', L'₅ and L'₇, L"₁ and L"₃, L"₁ and L", or L"₅ and L"₇, together denote an organic linking group; provided that at least one of L, L', L", L₁, L'₁, L"₁, L₂, L'₂, L"₂, L₃, L'₃, L"₃, L₄, L'₄, L"₄, L₅, L'₅, L"₅, L₆, L'₆, L"₆, L₇, L'₇, L"₇, L₈, L'₈ and L"₈ is other than hydrogen; X, X' and X" independently of one another are a single bond, CR_aR_b O, S, NR_c or NCOR_c; R_a, R_b and R_c independently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

JP5903840	Salt and resist composition
JP2905274	[Title of Invention] A novel polycation compound and a bleaching agent composition containing the novel polycation compound.
WO/2004/078703	ACID GENERATORS, SULFONIC ACIDS, SULFONYL HALIDES, AND RADIATION-SENSITIVE RESIN COMPOSITIONS

HAYOZ PASCAL (CH)
ILG STEPHAN (CH)

PCT/EP2007/053280

January 03, 2008

April 04, 2007

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CIBA SC HOLDING AG (CH)
HAYOZ PASCAL (CH)
ILG STEPHAN (CH)

C07C381/12; C09D11/10

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