Title:
SUPPORTED METAL CATALYST AND PRODUCTION METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2023/017771
Kind Code:
A1
Abstract:
A supported metal catalyst is provided which has excellent utilization efficiency of active metal particles. This supported metal catalyst is provided with a carrier, which is an aggregate of conductive particles, and active metal particles, which are supported dispersed on the conductive particles. The conductive particles include multiple pores; the pores have an average entrance pore size of 1-20nm, the standard deviation of the average entrance pore size is less than or equal to 50% of the average entrance pore size, and the fraction of the active metal particles supported on the surface layer region of the conductive particles is greater than or equal to 50%. The surface layer region is a region on the surface of the conductive particles, or the region in the pores with a depth no more than 15nm from the surface; the active metal particles have an average inter-particle distance of 5-20nm, and the standard deviation of tshe average inter-particle distance is less than or equal to 50% of the average inter-particle distance.
Inventors:
MIYAO TOSHIHIRO (JP)
NISHINO HANAKO (JP)
UCHIDA MAKOTO (JP)
IIYAMA AKIHIRO (JP)
KOIZUMI NAOTO (JP)
SHIBANUMA KAZUYA (JP)
TONE NAOKI (JP)
NISHINO HANAKO (JP)
UCHIDA MAKOTO (JP)
IIYAMA AKIHIRO (JP)
KOIZUMI NAOTO (JP)
SHIBANUMA KAZUYA (JP)
TONE NAOKI (JP)
Application Number:
PCT/JP2022/029914
Publication Date:
February 16, 2023
Filing Date:
August 04, 2022
Export Citation:
Assignee:
UNIV YAMANASHI (JP)
NIKKI UNIVERSAL CO LTD (JP)
NIKKI UNIVERSAL CO LTD (JP)
International Classes:
H01M4/86; B01J23/42; B01J35/10; B01J37/02; B01J37/04; B01J37/10; B01J37/12; B01J37/18; B01J37/34; H01M4/88; H01M4/90; H01M4/92; H01M8/10
Domestic Patent References:
WO2014175106A1 | 2014-10-30 | |||
WO2021161929A1 | 2021-08-19 | |||
WO2021193257A1 | 2021-09-30 |
Foreign References:
JP2019204700A | 2019-11-28 | |||
JP2018010806A | 2018-01-18 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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