SURFACE SHAPE MEASURING METHOD AND DEVICE THEREFOR

WIPO Patent Application WO/2003/036229

A1

A reference face (15) and a face (31) to be measured are irradiated with a white light from a white light source (10) to make an optical path difference. A CPU (20) samples the intensity value of an interference light varying at a specific portion of the face (31) because of the optical path difference, at sampling intervals of a product M•&Dgr of &Dgr = (&lgr _C² - &lgr _B²)/4&lgr _C and a natural number M where &lgr _C is the center wavelength of a specific frequency band restricted by a band-pass filter (11) and 2 &lgr _B is the band width of the wavelength. In the case of a spectral distribution symmetric with respect to a center wave number k_C of the specific frequency band, a characteristic function having a peak position which is identical to the peak position of the interference light is inferred. The irregular shape of the face (31) is measured by determining the height of the peak position of the characteristic function.

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HIRABAYASHI AKIRA (JP)
KITAGAWA KATSUICHI (JP)

PCT/JP2001/009416

May 01, 2003

October 25, 2001

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TORAY ENG CO LTD (JP)
YUGEN KAISHA YAMAGUCHI TLO (JP)
HIRABAYASHI AKIRA (JP)
KITAGAWA KATSUICHI (JP)

G01B9/02; G01B11/24; (IPC1-7): G01B11/24; G01B9/02

JP2001066122A	2001-03-16
JPH09318329A	1997-12-12
US6028670A	2000-02-22
US5471303A	1995-11-28

Sugitani, Tsutomu (Nishitenma 1-chome Kita-ku Osaka-shi, Osaka, JP)

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