Title:
SUSCEPTOR WITH EPITAXIAL GROWTH CONTROL DEVICES AND EPITAXIAL REACTOR USING THE SAME
Document Type and Number:
WIPO Patent Application WO2003023093
Kind Code:
A3
Abstract:
A susceptor (1) for epitaxial growth reactors comprises a body (2) having a lower base (3), an upper top (4) and some substantially flat side faces (5); the side faces are adapted to receive, in predetermined areas (6), substrates on which the epitaxial growth develops; body (2) is provided with edge side regions (7) defined by couples of adjacent side faces (5); along edge side regions (7) in the upper part of body (2) there are provided first ribs (8) adapted to control the flow of reaction gases along side faces (5); along edge side regions (7) in the lower part of body (2) there are provided second ribs (9) adapted to control the flow of reaction gases along side faces (5).
Inventors:
PRETI FRANCO (IT)
YARLAGADDA SRINIVAS (US)
YARLAGADDA SRINIVAS (US)
Application Number:
PCT/EP2002/010043
Publication Date:
December 11, 2003
Filing Date:
September 05, 2002
Export Citation:
Assignee:
LPE SPA (IT)
PRETI FRANCO (IT)
YARLAGADDA SRINIVAS (US)
PRETI FRANCO (IT)
YARLAGADDA SRINIVAS (US)
International Classes:
C23C16/458; C23C16/455; C30B25/12; H01L21/205; H01L21/683; C23C16/44; (IPC1-7): C30B25/12; C23C16/458
Domestic Patent References:
| WO2000058533A1 | 2000-10-05 |
Foreign References:
| EP0415191A1 | 1991-03-06 | |||
| US4638762A | 1987-01-27 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 014, no. 509 (C - 0776) 7 November 1990 (1990-11-07)
Download PDF: