Title:
SYNTHESIS METHOD FOR A COMPOUND USED TO FORM A SELF-ASSEMBLED MONOLAYER, COMPOUND FOR FORMING A SELF-ASSEMBLED MONOLAYER, AND LAYER STRUCTURE FOR A SEMICONDUCTOR COMPONENT
Document Type and Number:
WIPO Patent Application WO2004113419
Kind Code:
A3
Abstract:
The invention relates to a synthesis method for a compound used to form a self-assembled monolayer, especially a monolayer for a semiconductor component, said method being characterised in that: a) it comprises a first synthesis step wherein a terminal nucleophile substitution of the halogen with a group able to perform a PI - PI interaction, especially a group having at least one aromatic group (Ar), is carried out on a <-halogen-alk-1-ene (I), and b) the product of the first synthesis step is hydrolysed in a second synthesis step. The invention also relates to compounds for forming a self-assembled monolayer, and a layer structure. The inventive synthesis method thus enables compounds to be efficiently produced, generating a high yield and simple cleaning requirements.
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Inventors:
EFFENBERGER FRANZ (DE)
SCHUETZ MARKUS (DE)
MAISCH STEFFEN (DE)
SEIFRITZ STEFFEN (DE)
SCHMID GUENTER (DE)
HALIK MARCUS (DE)
KLAUK HAGEN (DE)
ZSCHIESCHANG UTE (DE)
HOLBERG STEFAN (DE)
SCHUETZ MARKUS (DE)
MAISCH STEFFEN (DE)
SEIFRITZ STEFFEN (DE)
SCHMID GUENTER (DE)
HALIK MARCUS (DE)
KLAUK HAGEN (DE)
ZSCHIESCHANG UTE (DE)
HOLBERG STEFAN (DE)
Application Number:
PCT/DE2004/001319
Publication Date:
March 31, 2005
Filing Date:
June 18, 2004
Export Citation:
Assignee:
INFINEON TECHNOLOGIES AG (DE)
EFFENBERGER FRANZ (DE)
SCHUETZ MARKUS (DE)
MAISCH STEFFEN (DE)
SEIFRITZ STEFFEN (DE)
SCHMID GUENTER (DE)
HALIK MARCUS (DE)
KLAUK HAGEN (DE)
ZSCHIESCHANG UTE (DE)
HOLBERG STEFAN (DE)
EFFENBERGER FRANZ (DE)
SCHUETZ MARKUS (DE)
MAISCH STEFFEN (DE)
SEIFRITZ STEFFEN (DE)
SCHMID GUENTER (DE)
HALIK MARCUS (DE)
KLAUK HAGEN (DE)
ZSCHIESCHANG UTE (DE)
HOLBERG STEFAN (DE)
International Classes:
C07F7/12; C07F7/14; C08G85/00; H01L51/00; H01L51/10; H01L51/40; H01L51/05; (IPC1-7): H01L51/20; C07F7/12; C07F7/14
Other References:
NATARAJAN BALACHANDER, CHAIM N. SUKENIK: "Monolayer Transformation by Nucleophilic Substitution: Applications to the Creation of New Monolayer Assemblies", LANGMUIR, vol. 6, no. 11, November 1990 (1990-11-01), ISSN 0743-7463, pages 1621 - 1627, XP002313921
TILLMAN N ET AL: "A novel self-assembling monolayer film containing a sulfone-substituted aromatic group", LANGMUIR, AMERICAN CHEMICAL SOCIETY, NEW YORK, NY, US, vol. 6, 1990, pages 1512 - 1518, XP002300327, ISSN: 0743-7463
BARNESS, YITZHAK ET AL: "Functionalized Silanes for the Preparation of Siloxane-Anchored Monolayers", LANGMUIR , 16(1), 247-251 CODEN: LANGD5; ISSN: 0743-7463, 2000, XP002313922
GERSHEWITZ ET AL: "Effect of Molecule-Molecule Interaction on the Electronic Properties of Molecularly Modified Si/SiOx Surfaces", JOURNAL OF PHYSICAL CHEMISTRY. B, MATERIALS, SURFACES, INTERFACES AND BIOPHYSICAL, WASHINGTON, DC, US, vol. 108, no. 2, 2004, pages 664 - 672, XP002299962, ISSN: 1089-5647
TILLMAN N ET AL: "A novel self-assembling monolayer film containing a sulfone-substituted aromatic group", LANGMUIR, AMERICAN CHEMICAL SOCIETY, NEW YORK, NY, US, vol. 6, 1990, pages 1512 - 1518, XP002300327, ISSN: 0743-7463
BARNESS, YITZHAK ET AL: "Functionalized Silanes for the Preparation of Siloxane-Anchored Monolayers", LANGMUIR , 16(1), 247-251 CODEN: LANGD5; ISSN: 0743-7463, 2000, XP002313922
GERSHEWITZ ET AL: "Effect of Molecule-Molecule Interaction on the Electronic Properties of Molecularly Modified Si/SiOx Surfaces", JOURNAL OF PHYSICAL CHEMISTRY. B, MATERIALS, SURFACES, INTERFACES AND BIOPHYSICAL, WASHINGTON, DC, US, vol. 108, no. 2, 2004, pages 664 - 672, XP002299962, ISSN: 1089-5647
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