Title:
SYSTEM AND DEVICE FOR PROCESSING SUPERCRITICAL AND SUBCRITICAL FLUID
Document Type and Number:
WIPO Patent Application WO/2003/035240
Kind Code:
A1
Abstract:
A system for processing supercritical and subcritical fluid capable of bringing the inside of at least one processing container (1) formed in a flow passage into a supercritical or subcritical high pressure field, wherein thermal operation is applied to process fluid to apply thermal expansion to the fluid to produce a pressure difference between the processing container (1) and the outside, whereby a specified temperature and the high pressure field suitable for the processing of the supercritical or subcritical fluid can be provided in the processing container (1).
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Inventors:
ARAI KUNIO (JP)
INOMATA HIROSHI (JP)
SMITH RICHARD LEE JR (JP)
INOMATA HIROSHI (JP)
SMITH RICHARD LEE JR (JP)
Application Number:
PCT/JP2002/010509
Publication Date:
May 01, 2003
Filing Date:
October 09, 2002
Export Citation:
Assignee:
TOHOKU TECHNO ARCH CO LTD (JP)
ARAI KUNIO (JP)
INOMATA HIROSHI (JP)
SMITH RICHARD LEE JR (JP)
ARAI KUNIO (JP)
INOMATA HIROSHI (JP)
SMITH RICHARD LEE JR (JP)
International Classes:
B01D9/02; B01D11/00; B01J3/00; B01J3/02; B01J3/04; B01J19/00; B01J19/24; (IPC1-7): B01J3/00; B01J3/02; B01D11/00; B01D9/00; B08B7/00; D06B19/00
Foreign References:
| JP2000117222A | 2000-04-25 |
Attorney, Agent or Firm:
Shigenobu, Kazuo (Kojimachi 4-chome Chiyoda-ku, Tokyo, JP)
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