Title:
SYSTEM AND METHOD FOR CONTROLLED ELECTROSPRAY DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/150070
Kind Code:
A3
Abstract:
The present invention is directed to a system and method for controlled electrospray deposition. The system comprises an electrospray apparatus and substrate including a plurality of exposed portions of one or more conductive elements electrically insulated from one another by an insulating element. During operation, the system may be used to deposit a plurality of small sample spots on the substrate surface to facilitate high through-put analysis. Also disclosed are substrates suitable for use in the system and method of the invention.
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Inventors:
OWENS KEVIN (US)
HAULENBEEK JONATHAN (US)
HAULENBEEK JONATHAN (US)
Application Number:
PCT/US2011/037918
Publication Date:
May 10, 2012
Filing Date:
May 25, 2011
Export Citation:
Assignee:
OWENS KEVIN (US)
HAULENBEEK JONATHAN (US)
UNIV DREXEL (US)
HAULENBEEK JONATHAN (US)
UNIV DREXEL (US)
International Classes:
B05B5/025; B05B5/08
Domestic Patent References:
| WO2005065541A2 | 2005-07-21 |
Foreign References:
| US20020048770A1 | 2002-04-25 | |||
| US20080042055A1 | 2008-02-21 | |||
| US20070202258A1 | 2007-08-30 | |||
| US7081621B1 | 2006-07-25 |
Attorney, Agent or Firm:
DUNLEAVY, Kevin J. (LLC1628 John F. Kennedy Boulevard,Eight Penn Center, Suite 135, Philadelphia Pennsylvania, US)
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