Title:
SYSTEM FOR AND METHOD OF ENSURING ACCURATE SHADOW MASK-TO-SUBSTRATE REGISTRATION IN A DEPOSITION PROCESS
Document Type and Number:
WIPO Patent Application WO2006022651
Kind Code:
A8
Abstract:
A deposition system uses the same low coefficient of thermal expansion (CTE) material, for example, a CTE of below 10 ppm/°C in the temperature range of 0-200°C, for forming both a shadow mask and a substrate upon which depositions occur in order to overcome the heating effects of a high-temperature deposition process, thereby ensuring a uniform expansion and contraction rate of the shadow mask and the substrate.
Inventors:
BRODY THOMAS PETER (US)
Application Number:
PCT/US2004/024353
Publication Date:
June 08, 2006
Filing Date:
July 29, 2004
Export Citation:
Assignee:
ADVANTECH GLOBAL LTD (GB)
BRODY THOMAS PETER (US)
BRODY THOMAS PETER (US)
International Classes:
H01L21/44
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