SYSTEM AND METHOD FOR PREDICTING SOFTWARE MODELS USING MATERIAL-CENTRIC PROCESS INSTRUMENTATION

Title:

SYSTEM AND METHOD FOR PREDICTING SOFTWARE MODELS USING MATERIAL-CENTRIC PROCESS INSTRUMENTATION

Document Type and Number:

WIPO Patent Application WO2001075534

Kind Code:

A3

Abstract:

A system and method for predicting software models used in chemical mechanical polishing (CMP) of workpieces using material-centric process instrumentation. One embodiment is a system which includes a feed forward loop (44) for computing predictive calculations, a feed back loop (46) for computing run-to-run calculations, a historical database (48) which links together the feed forward and feed back loops, and a computational engine (56) used to calculate new or adjusted CMP process parameters.

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Inventors:

MENDEZ RAFAEL (US)
SMITH RANDY (US)
WELDON MATTHEW (US)
MOKSHAGUNDAM ADITHYA (US)
WASINGER DAVID G (US)

Application Number:

PCT/US2001/010477

Publication Date:

May 23, 2002

Filing Date:

March 30, 2001

Export Citation:

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Assignee:

SPEEDFAM IPEC CORP (US)
MENDEZ RAFAEL (US)
SMITH RANDY (US)
WELDON MATTHEW (US)
MOKSHAGUNDAM ADITHYA (US)
WASINGER DAVID G (US)

International Classes:

G05B13/02; G05B13/04; G05B17/02; G05B19/042; (IPC1-7): G05B13/04

Domestic Patent References:

WO2000000874A1	2000-01-06
WO1999025520A1	1999-05-27

Foreign References:

US5661669A	1997-08-26
US5740033A	1998-04-14

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